An evaporator uses an electric resistance heater or high-energy beam to melt material and to raise its vapor pressure to a useful range. This process takes place in a high vacuum state to allow the vapor to reach the substrate without reacting with or scattering against other gas-phase atoms in the chamber while reducing the incorporation of impurities from the residual gas in the vacuum chamber. The KVE Series evaporation systems are capable of fabricating multi-layer thin films by applying this co-deposition process.
? Excellent Thickness Uniformity
The KVE Series GLAD E-Beam Evaporator System provide excellent thickness uniformity of resultant films. if you deposit the thin film under same conditions, you will get a thin films of same characteristics
? Control the angle of substrate
This system includes the ability to adjust the angle of substrate. So you can deposit the thin film which have various orientation.
? Always maintain high vacuum degree in process The systems have a process chamber and a loadlock chamber(option).
Loadlock chamber(option) is used for sample loading.
So process chamber is maintained high vacuum state always.